Industries > Semiconductor > Semiconductor Application - Chemical Mechanical Polishing (CMP)
Semiconductor Application - Chemical Mechanical Polishing (CMP)
Precise control of the swing arm position and polishing pad speed are critical for polishing wafers.
We provide motor and actuator solutions that are highly responsive and reliable to avoid polishing too much of the substrates away.
Common Requests
- High torque
- High inertia
- Minimize footprint
- Increase reliability
- Increase responsiveness
Solutions
Suitable for Arm Rotation
AZ Series Stepper Motors with Mechanical Absolute Encoder
- Compact right-angle geared motor
- Handles high inertial loads
- Highly responsive and reliable αSTEP closed-loop technology
Suitable for Polishing
DGII Series Hollow Rotary Actuators
- Powerful and rigid design
- Large hollow bore diameter
- Highly responsive and reliable αSTEP closed-loop technology
Engineering Notes
We're Here to Help
Business Hours:
Monday to Friday
8:30am EST to 5:00pm PST
Sales & Customer Service:
1-800-418-7903
Technical Support:
1-800-468-3982
